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Penetration depth due to substrate consistency.
It's because of the need for an additional electron beam of relatively low energy. this compensates for the charge build up caused by ion impact at the surface of the sample. The ratio of the current and electron beam ion densities affect the resolution of the secondary ions. Compensation for these secondary ions is critical.
It's because of the need for an additional electron beam of relatively low energy. this compensates for the charge build up caused by ion impact at the surface of the sample. The ratio of the current and electron beam ion densities affect the resolution of the secondary ions. Compensation for these secondary ions is critical.
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